Gatan Precision Ion Polishing System (PIPS II)
Used to sputter away material from a localised region of a sample with 2 coincident beams of low energy argon.
Used to sputter away material from a localised region of a sample with 2 coincident beams of low energy argon.
PIE Scientific Tergeo EM Plasma Cleaner – used to remove carbon contamination from the surfaces of TEM samples or bulk materials.